Indian Journal of Pure and Applied Physics

Open Access Open Access  Restricted Access Subscription Access

Effect of Ag Layer Thickness and Interference of Cu-SnO2/Ag/Cu-SnO2(CTO/Ag/CTO) Multilayer Thin Film on the Electrical and Optical Properties


Affiliations
1 Department of Physics, Institute of Integrated and Honors Studies, Kurukshetra University, Kurukshetra, Haryana 136 119, India
 

The present study reports the successful fabrication of CTO/Ag/CTO multilayer thin films with different sandwiched layer (Ag) thickness on a glass substrate by the E-beam evaporation Method. The influence of sandwiched layer thickness and stacking of layers on electrical and optical properties was investigated. Several analytical tools such as X-ray diffraction, Atomic Force microscopy, Hall Effect measurement, and UV-visible spectroscopy were used to investigate the morphological, electrical, and optical properties of the multilayer thin film structure. Multilayer thin film with 14nm Ag thickness exhibited a good combination of conductivity and transmittance (i.e. 4.64 × 104 Ω-1cm-1, 69.3%). The conduction mechanism can be explained on the basis of the islands growth mechanism of Volmer-weber model as Ag film was grown on an amorphous CTO surface. The Haacke’s figure of merit was calculated for valuing the overall performance of the transparent conducting film. The maximum figure of merit is reported as 8.7 × 10-3 Ω-1 for multilayer thin film having Ag thickness of 14nm.

Keywords

Multilayer thin films; Electrical properties; Optical properties; Conduction mechanism.
User
Notifications
Font Size

  • Chopra K L, Major S & Pandya D K, Thin Solid Films, 102 (1983) 1.

  • Stadler A, Materials, 5 (2012) 661.

  • Dixon S C, Scanlon D O, Carmalt C J & Parkin I P, J Mater Chem C, 4 (2016) 6946.

  • Sahu D R, Lin S Y & Huang J L, Thin Solid Films, 516 (2008) 4728.

  • Choi K H, Kim J Y, Lee Y S & Kim H J, Thin Solid Films, 341 (1999) 152.

  • Dhar A & Alford T L, J Appl Phys, 112 (2012) 103113.

  • Han H, Theodore N D & Alford T L, J Appl Phys, 103 (2008) 013708.

  • Patterson A L, Phys Rev, 56 (1939) 978.

  • Zak A K, Majid W A, Abrishami M E & Yousefi R, Solid State Sci, 13 (2011) 251.

  • Wang P, Zhang D, Kim D H, Qiu Z, Gao L, Murakami R I & Song X, J Appl Phys, 106 (2009) 103104.

  • Lozovoy K A, Korotaev A G, Kokhanenko A P, Dirko V V & Voitsekhovskii A V C, Surf Coat Technol, 384 (2020) 125289.

  • Andersson T & Granqvist C G, J Appl Phys, 48 (1977) 1673.

  • Yu S, Zhang W, Li L, Xu D, Dong H & Jin Y, Thin Solid Films, 552 (2014) 150.

  • Biegański P, Dobierzewska-Mozrzymas E, Pieciul E & Szymczak G, Vacuum, 74 (2004) 211.

  • Haacke G, J Appl Phys, 479 (1976) 4086.


Abstract Views: 28

PDF Views: 20




  • Effect of Ag Layer Thickness and Interference of Cu-SnO2/Ag/Cu-SnO2(CTO/Ag/CTO) Multilayer Thin Film on the Electrical and Optical Properties

Abstract Views: 28  |  PDF Views: 20

Authors

Anju Dutta
Department of Physics, Institute of Integrated and Honors Studies, Kurukshetra University, Kurukshetra, Haryana 136 119, India
Sangeeta
Department of Physics, Institute of Integrated and Honors Studies, Kurukshetra University, Kurukshetra, Haryana 136 119, India
Harpreet Singh
Department of Physics, Institute of Integrated and Honors Studies, Kurukshetra University, Kurukshetra, Haryana 136 119, India
Anand Kumar
Department of Physics, Institute of Integrated and Honors Studies, Kurukshetra University, Kurukshetra, Haryana 136 119, India

Abstract


The present study reports the successful fabrication of CTO/Ag/CTO multilayer thin films with different sandwiched layer (Ag) thickness on a glass substrate by the E-beam evaporation Method. The influence of sandwiched layer thickness and stacking of layers on electrical and optical properties was investigated. Several analytical tools such as X-ray diffraction, Atomic Force microscopy, Hall Effect measurement, and UV-visible spectroscopy were used to investigate the morphological, electrical, and optical properties of the multilayer thin film structure. Multilayer thin film with 14nm Ag thickness exhibited a good combination of conductivity and transmittance (i.e. 4.64 × 104 Ω-1cm-1, 69.3%). The conduction mechanism can be explained on the basis of the islands growth mechanism of Volmer-weber model as Ag film was grown on an amorphous CTO surface. The Haacke’s figure of merit was calculated for valuing the overall performance of the transparent conducting film. The maximum figure of merit is reported as 8.7 × 10-3 Ω-1 for multilayer thin film having Ag thickness of 14nm.

Keywords


Multilayer thin films; Electrical properties; Optical properties; Conduction mechanism.

References