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Gupta, Neena
- High Performance Electrical & Optical Interconnects
Abstract Views :170 |
PDF Views:4
Authors
Jyoti Kedia
1,
Neena Gupta
1
Affiliations
1 PEC University of Technology, Chandigarh, IN
1 PEC University of Technology, Chandigarh, IN
Source
Programmable Device Circuits and Systems, Vol 3, No 8 (2011), Pagination: 402-405Abstract
With scaling technologies ranging from 180 nm to 35 nm the magnitude of interconnects problem has increased manifold. The global wires are much more affected as compared to the local and semi global interconnects. In this paper the high performance interconnects has been investigated. The effect of scaling of dimensions on interconnection in VLSICs has been examined. The comparison of underlying physics of electrical and optical interconnects has been done along with the requirements of optical devices for optics to solve the problems of interconnects in future.Keywords
Scaling, Copper Interconnects, Low K Dielectrics, Optical Interconnects.- Realization of All-Optical NOR Gate at 10-Gb/s by Cascading OR and NOT Gates
Abstract Views :166 |
PDF Views:3
Authors
Affiliations
1 PEC University of Technology, Sector 12-A, Chandigarh, IN
1 PEC University of Technology, Sector 12-A, Chandigarh, IN