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Ojha, V. N.
- Investigations into Roughness of Mass Standards at NPL-I
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1 National Physical Laboratory (CSIR), New Delhi-110012, IN
1 National Physical Laboratory (CSIR), New Delhi-110012, IN
Source
Manufacturing Technology Today, Vol 11, No 6 (2012), Pagination: 25-26Abstract
The surface quality of mass standards is on important parameter. Surface roughness of moss standards is important as it is known to be related to contamination with pollutants (such as adsorbed water vapors etc.) and the stability of moss standards. There is a growing interest in surface roughness measurement among mass metrologist. In the present paper we present the work carried out to investigate the roughness of mass standards and try to correlate it with stability of mass standards.Keywords
Roughness, Mass Standards, White Light Interferometry.- Surface Preparation of Crystal and Characterization of Surface Roughness Using Power Spectral Density Analysis
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Authors
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1 National Physical Laboratory (CSIR), Dr K. S. Krishnan Marg, New Delhi, IN
1 National Physical Laboratory (CSIR), Dr K. S. Krishnan Marg, New Delhi, IN