Abstract Views :261 |
PDF Views:82
Authors
Affiliations
1 Centre for Nano Science and Engineering,
Indian Institute of Science, Bangalore
560 012, IN
Source
Current Science, Vol 107, No 5 (2014), Pagination: 749-752
Abstract
We report on the fabrication of polymethylmethacrylate (PMMA) nanogratings on silicon (Si) and glass substrates using electron beam lithography technique. Various aspects of proximity corrections using Monte Carlo simulation have been discussed. The fabrication process parameters such as proximity gap of exposure, exposure dosage and developing conditions have been optimized for high-density PMMA nanogratings structure on Si and glass substrates. Electron beam exposure is adjusted in such a way that PMMA acts as a negative tone resist and at the same time resolution loss due to proximity effect is minimum. Both reflection and transmission-type, nanometre period gratings have been fabricated and their diffraction characteristics are evaluated.
Full Text
